Micro- and nanofabrication for quantum engineering

• Account for the interaction between diffusion, oxidation, and nitridation mediated by point defects, and predict the results of these effects on a fabrication process
• Account for the fundamental physics of molecules and atoms in a vacuum chamber and the basic equipment used to produce and measure vacuum and for the use of DC- and RF-generated plasmas for deposition and etching
• Account for how deposition process parameters affect film properties including step coverage and trench filling, and use this understanding to optimize deposition process parameters to meet target specifications if at all possible
• Account for how etch process parameters affect the etch performance including selectivity and anisotropy and based on this tailor the etch parameters for target specifications
• Explain how crystal growth methods are used to produce relevant quantum materials and how the methods affect the properties of the materials and impact subsequent component manufacturing processes, and on this basis choose the best substrate for a given application
• Explain in detail the physics and photochemistry of nanolithography and use this knowledge to optimize the lithographic process
• Explain how the etch procedure effects the final performance of the envisioned quantum device due to e.g. sidewall roughness
• Explain how smart-cut thin film technology can be used in the fabrication process for quantum devices
• Explain advanced methods such as flip-chip bonding, use of shadow masks, selective area crystal growth, and integration of electronic and optical quantum components for the manufacturing of quantum systems
• In small groups, analyze the design of specific quantum devices and systems described in the scientific literature, explain the chosen manufacturing methods, discuss the fabrication process flow, and suggest improved methods

Physics and chemistry of nanofabrication processes for quantum devices, including crystal growth, epitaxy, thin film techniques, low-pressure CVD (Chemical Vapor Deposition), oxidation, diffusion, etching and nanolithography as well as physical and electrical characterization of materials and subprocesses. Analysis and description of the design of specific quantum components, such as Pockels effect electro-optical transducers, single photon sources and superconducting electronic devices.

• 6 – 20 (Fri 13-17)

22600, Or equivalent courses

Lectures, guest lectures, case-based teaching, group work, literature studies, report writing in groups.

The course can be taken as an extension of 22600.